A Rapid Modeling Technique
for Measurable Improvements In Factory Performance
Authors:
Andreas Peikert
Steven Brown
Josef Thoma
Siemens AG
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Abstract:
This paper discusses a methodology for
quickly investigating problem areas in
semiconductor wafer fabrication factories by
creating a model for the production area of
interest only (as opposed to a model of the
complete factory operation). All other factory
operations are treated as “black
boxes.” Specific assumptions are made to
capture the effect of reentrant flow. This
approach allows a rapid response to production
questions when beginning a new simulation
project. The methodology was applied to a
cycle-time and capacity analysis of the
photolithography operation for Siemens’
Dresden wafer fab. The results of this
simulation study are presented.
This paper was published in Proceedings
of the 1998 Winter Simulation Conference,
December 5-8, 1998. You can download a copy in
PDF (172 KB) by right-clicking on this
link. If
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